Photomask Japan 2026
Join us at Photomask Japan 2026 on April 8 -10 at Annex Hall, Pacifico Yokohama, Yokohama, Japan, to explore our latest samples and to discuss how Canatu can enable the next step in semiconductor performance. Photomask Japan the 32nd international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. At our booth, Canatu will exhibit the latest developments, including CNT pellicle membranes, inspection membranes, and optical filters.
Enabling the next step in semiconductor productivity
Canatu CNT pellicle membranes support the productivity increase potential in the EUV lithography process by up to 8-15%
Enhancing quality control in pre-and post-lithography processes
Canatu inspection membranes are used in EUV mask inspection to filter debris generated by the EUV light source, protecting optics from contamination.
Improving measurement precision in EUV process monitoring
Canatu optical filters block short-wavelength photons and high-energy particles that can interfere with the measurement process, while providing high EUV/X-Ray transmittance.
Creating advanced CNT membranes using CNT100 SEMI reactors and Dry Deposition process
Canatu produces advanced CNT membranes using its patented Dry Deposition process and CNT100 SEMI reactors. The CNT100 SEMI reactor is tailored for high-precision CNT pellicle membrane production. In 2024, Canatu shipped its first two CNT100 SEMI reactors. The first reactor received Site Acceptance Test approval in July 2025.
Visit our booth to explore our latest samples and connect with our experts. Fill out the form below to book a meeting with the Canatu team!
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